Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
- Patent Title (中): 检测方法和装置，光刻设备，光刻处理单元和用于确定基板性质的器件制造方法
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Application No.: US13123613Application Date: 2009-10-22
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Publication No.: US08848195B2Publication Date: 2014-09-30
- Inventor: Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
- Applicant: Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2009/063918 WO 20091022
- International Announcement: WO2010/049348 WO 20100506
- Main IPC: G01N21/47
- IPC: G01N21/47 ; G03F7/20
Abstract:
In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
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