Invention Grant
US08860943B2 High sensitivity plasmonic structures for use in surface plasmon resonance sensors and method of fabrication thereof
有权
用于表面等离子体共振传感器的高灵敏度等离子体激元结构及其制造方法
- Patent Title: High sensitivity plasmonic structures for use in surface plasmon resonance sensors and method of fabrication thereof
- Patent Title (中): 用于表面等离子体共振传感器的高灵敏度等离子体激元结构及其制造方法
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Application No.: US13320045Application Date: 2010-05-12
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Publication No.: US08860943B2Publication Date: 2014-10-14
- Inventor: Jean-François Masson , Ludovic S. Live , Marie-Pier Murray-Méthot
- Applicant: Jean-François Masson , Ludovic S. Live , Marie-Pier Murray-Méthot
- Applicant Address: unknown Montreal, QC
- Assignee: Valorisation-Recherche, Limited Partnership
- Current Assignee: Valorisation-Recherche, Limited Partnership
- Current Assignee Address: unknown Montreal, QC
- Agency: Norton Rose Fulbright Canada LLP
- Agent Alexandre Daoust
- International Application: PCT/CA2010/000730 WO 20100512
- International Announcement: WO2010/130045 WO 20101118
- Main IPC: G01N21/55
- IPC: G01N21/55
Abstract:
There is disclosed a method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising: coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask. This is also disclosed a plasmonic structure for use in a surface plasmon resonance sensor, comprising: an adsorption layer; and a metallic film deposited on the adsorption layer; wherein the adsorption layer and the metallic film comprises an array of microholes.
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