Invention Grant
- Patent Title: Apparatus and method of application and development
- Patent Title (中): 仪器和应用与开发方法
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Application No.: US12909191Application Date: 2010-10-21
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Publication No.: US08863373B2Publication Date: 2014-10-21
- Inventor: Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
- Applicant: Nobuaki Matsuoka , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell LLP
- Priority: JP2005-084546 20050323
- Main IPC: B23P19/00
- IPC: B23P19/00 ; H05K3/36 ; H05K3/10 ; H01L21/67

Abstract:
An application and development apparatus has a plurality of vertically stacked blocks directed to coating film formation on a substrate. This plurality of blocks includes first processing units, a first substrate transportation region, and a first transportation unit for transporting substrates between the first processing units within the first transportation region. A development process block also is vertically stacked with the blocks directed to coating film formation to constitute a layered block as the process block. The development process block also includes second processing units and a second transportation unit for transporting substrates between the second processing units within the second transportation region. The application and development apparatus further has a shelf-type delivery stage group, a vertical transportation unit and a substrate inspection unit such that a substrate input into the inspection unit passes through the delivery stage group from the vertical transportation unit.
Public/Granted literature
- US20110032494A1 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT Public/Granted day:2011-02-10
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