Invention Grant
US08864481B2 Mold for casting polycrystalline silicon ingot, and silicon nitride powder for mold release material thereof, slurry containing silicon nitride powder for mold release layer thereof and mold release material for casting thereof 有权
用于铸造多晶硅锭的模具和用于其脱模材料的氮化硅粉末,其含有用于其脱模层的氮化硅粉末和用于其脱模的脱模材料的浆料

  • Patent Title: Mold for casting polycrystalline silicon ingot, and silicon nitride powder for mold release material thereof, slurry containing silicon nitride powder for mold release layer thereof and mold release material for casting thereof
  • Patent Title (中): 用于铸造多晶硅锭的模具和用于其脱模材料的氮化硅粉末,其含有用于其脱模层的氮化硅粉末和用于其脱模的脱模材料的浆料
  • Application No.: US13976280
    Application Date: 2011-07-27
  • Publication No.: US08864481B2
    Publication Date: 2014-10-21
  • Inventor: Takeshi YamaoMichio HondaShinsuke Jida
  • Applicant: Takeshi YamaoMichio HondaShinsuke Jida
  • Applicant Address: JP Ube-shi
  • Assignee: Ube Industries, Ltd.
  • Current Assignee: Ube Industries, Ltd.
  • Current Assignee Address: JP Ube-shi
  • Agency: The Webb Law Firm
  • Priority: JP2010-293062 20101228
  • International Application: PCT/JP2011/067109 WO 20110727
  • International Announcement: WO2012/090543 WO 20120705
  • Main IPC: C30B11/00
  • IPC: C30B11/00 B28B7/36 C01B21/068 C01B33/02 C30B29/06
Mold for casting polycrystalline silicon ingot, and silicon nitride powder for mold release material thereof, slurry containing silicon nitride powder for mold release layer thereof and mold release material for casting thereof
Abstract:
Mold for casting a polycrystalline silicon ingot, and a silicon nitride powder for a mold release material thereof, a slurry containing a silicon nitride power for a mold release layer thereof, and a mold release material for casting thereof. The present invention relates to a silicon nitride powder for a mold release material of a mold for casting a polycrystalline silicon ingot characterized in that the percentage of primary particles of granular crystals monodispersed in powders is not less than 95% in terms of the area ratio calculated by analysis of an SEM image.
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