Invention Grant
US08866146B2 Lattice-mismatched GaInP LED devices and methods of fabricating same 有权
晶格不匹配的GaInP LED器件及其制造方法

Lattice-mismatched GaInP LED devices and methods of fabricating same
Abstract:
A method (100) of fabricating an LED or the active regions of an LED and an LED (200). The method includes growing, depositing or otherwise providing a bottom cladding layer (208) of a selected semiconductor alloy with an adjusted bandgap provided by intentionally disordering the structure of the cladding layer (208). A first active layer (202) may be grown above the bottom cladding layer (208) wherein the first active layer (202) is fabricated of the same semiconductor alloy, with however, a partially ordered structure. The first active layer (202) will also be fabricated to include a selected n or p type doping. The method further includes growing a second active layer (204) above the first active layer (202) where the second active layer (204) Is fabricated from the same semiconductor alloy.
Information query
Patent Agency Ranking
0/0