Invention Grant
US08867019B2 Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
有权
投影光学系统，曝光装置，曝光方法，显示制造方法，掩模和掩模制造方法
- Patent Title: Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
- Patent Title (中): 投影光学系统，曝光装置，曝光方法，显示制造方法，掩模和掩模制造方法
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Application No.: US13627526Application Date: 2012-09-26
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Publication No.: US08867019B2Publication Date: 2014-10-21
- Inventor: Masato Kumazawa , Tatsuo Fukui
- Applicant: Nikon Corporation
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2006-039446 20060216; JP2007-014631 20070125
- Main IPC: G03B27/44
- IPC: G03B27/44 ; G03B27/00 ; G03B27/42 ; G03F7/20 ; G03F9/00 ; G02B17/08 ; G03F1/00
Abstract:
An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.
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