Invention Grant
- Patent Title: Illumination system, lithographic apparatus and method of adjusting an illumination mode
- Patent Title (中): 照明系统,光刻设备和调节照明模式的方法
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Application No.: US13392022Application Date: 2010-03-18
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Publication No.: US08867021B2Publication Date: 2014-10-21
- Inventor: Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
- Applicant: Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2010/053539 WO 20100318
- International Announcement: WO2011/023419 WO 20110303
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72 ; G03F7/20

Abstract:
An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
Public/Granted literature
- US20120154777A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE Public/Granted day:2012-06-21
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