Invention Grant
- Patent Title: Internal member of a plasma processing vessel
- Patent Title (中): 等离子体处理容器的内部构件
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Application No.: US13901673Application Date: 2013-05-24
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Publication No.: US08877002B2Publication Date: 2014-11-04
- Inventor: Kouji Mitsuhashi , Hiroyuki Nakayama , Nobuyuki Nagayama , Tsuyoshi Moriya , Hiroshi Nagaike
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2002-345855 20021128
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306 ; H05H1/24 ; C23C16/44 ; H01J37/32
Abstract:
An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin.
Public/Granted literature
- US20130255881A1 INTERNAL MEMBER OF A PLASMA PROCESSING VESSEL Public/Granted day:2013-10-03
Information query
IPC分类:
