Invention Grant
- Patent Title: Method of manufacturing liquid injection head and exposure method
- Patent Title (中): 液体注射头的制造方法和曝光方法
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Application No.: US13857337Application Date: 2013-04-05
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Publication No.: US08877433B2Publication Date: 2014-11-04
- Inventor: Tetsushi Ishikawa , Tamaki Sato
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-099802 20120425
- Main IPC: B41J2/16
- IPC: B41J2/16

Abstract:
Provided is a method of manufacturing a liquid injection head, the method including: forming, on a substrate, a negative photosensitive resin layer having a first surface on a side opposite to the substrate and a second surface on the substrate side; carrying out first exposure of the negative photosensitive resin layer; carrying out second exposure of the negative photosensitive resin layer; and forming the ejection orifice by carrying out development after the first exposure and the second exposure in which each of the first surface and the second surface has a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure overlap and a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure do not overlap.
Public/Granted literature
- US20130288183A1 METHOD OF MANUFACTURING LIQUID INJECTION HEAD AND EXPOSURE METHOD Public/Granted day:2013-10-31
Information query
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