The invention relates to a multilayer film of A/B/C structure comprising: a first layer of composition A, comprising a fluoropolymer; a second layer of composition B, comprising a filled fluoropolymer; and a third layer of composition C, comprising a fluoropolymer, characterized in that the first and third layers have a melting point above 150° C., measured by DSC, and in that the transmittance in visible light is less than 30% for a multilayer film thickness of 25 μm. The invention also relates to the use of a fluoropolymer-based film preferably for a photovoltaic cell back panel, a high-performance textile or a metal, the film adhering to the substrate by means of an adhesive layer placed between the substrate and the film.