Invention Grant
- Patent Title: Reducing back-reflection in laser micromachining systems
- Patent Title (中): 减少激光微加工系统中的反射反射
-
Application No.: US12972021Application Date: 2010-12-17
-
Publication No.: US08878095B2Publication Date: 2014-11-04
- Inventor: Guangyu Li , Mehmet E. Alpay
- Applicant: Guangyu Li , Mehmet E. Alpay
- Applicant Address: US OR Portland
- Assignee: Electro Scientific Industries, Inc.
- Current Assignee: Electro Scientific Industries, Inc.
- Current Assignee Address: US OR Portland
- Agency: Stoel Rives LLP
- Main IPC: B23K26/06
- IPC: B23K26/06 ; B23K26/08 ; H01S3/00

Abstract:
Systems and methods reduce or prevent back-reflections in a laser processing system. A system includes a laser source to generate an incident laser beam, a laser beam output to direct the incident laser beam toward a work surface along a beam path, and a spatial filter. The system further includes a beam expander to expand a diameter of the incident laser beam received through the spatial filter, and a scan lens to focus the expanded incident laser beam at a target location on a work surface. A reflected laser beam from the work surface returns through the scan lens to the beam expander, which reduces a diameter of the reflected beam and increases a divergence angle of the reflected laser beam. The spatial filter blocks a portion of the diverging reflected laser beam from passing through the aperture and returning to the laser beam output.
Public/Granted literature
- US20120152918A1 REDUCING BACK-REFLECTION IN LASER MICROMACHINING SYSTEMS Public/Granted day:2012-06-21
Information query
IPC分类: