Invention Grant
- Patent Title: Fin field effect transistors including energy barriers
- Patent Title (中): 鳍场效应晶体管包括能量屏障
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Application No.: US13612376Application Date: 2012-09-12
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Publication No.: US08878191B2Publication Date: 2014-11-04
- Inventor: Chandra V. Mouli
- Applicant: Chandra V. Mouli
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: H01L29/15
- IPC: H01L29/15

Abstract:
A semiconductor device structure includes a transistor with an energy barrier beneath its transistor channel. The energy barrier prevents leakage of stored charge from the transistor channel into a bulk substrate. Methods for fabricating semiconductor devices that include energy barriers are also disclosed.
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