Invention Grant
US08878232B2 Method for producing group III nitride semiconductor light-emitting device
有权
III族氮化物半导体发光元件的制造方法
- Patent Title: Method for producing group III nitride semiconductor light-emitting device
- Patent Title (中): III族氮化物半导体发光元件的制造方法
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Application No.: US13527458Application Date: 2012-06-19
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Publication No.: US08878232B2Publication Date: 2014-11-04
- Inventor: Ryo Nakamura
- Applicant: Ryo Nakamura
- Applicant Address: JP Kiyosu-Shi, Aichi-Ken
- Assignee: Toyoda Gosei Co., Ltd.
- Current Assignee: Toyoda Gosei Co., Ltd.
- Current Assignee Address: JP Kiyosu-Shi, Aichi-Ken
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2011-139869 20110623
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/32 ; H01L21/02 ; H01L33/08

Abstract:
An MQW-structure light-emitting layer is formed by alternately stacking InGaN well layers and AlGaN barrier layers. Each well layer and each barrier layer are formed so as to satisfy the following relations: 12.9≦−2.8x+100y≦37 and 0.65≦y≦0.86, or to satisfy the following relations: 162.9≦7.1x+10z≦216.1 and 3.1≦z≦9.2, here x represents the Al compositional ratio (mol %) of the barrier layer, and y represents the difference in bandgap energy (eV) between the barrier layer and the well layer, and z represents the In compositional ratio (mol %) of the well layer.
Public/Granted literature
- US20120326205A1 METHOD FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE Public/Granted day:2012-12-27
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