Invention Grant
- Patent Title: 3D non-volatile memory device and method of manufacturing the same
- Patent Title (中): 3D非易失性存储器件及其制造方法
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Application No.: US13598528Application Date: 2012-08-29
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Publication No.: US08878277B2Publication Date: 2014-11-04
- Inventor: Ki Hong Lee , Seung Ho Pyi , Seok Min Jeon
- Applicant: Ki Hong Lee , Seung Ho Pyi , Seok Min Jeon
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2011-0138197 20111220
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A 3D non-volatile memory device includes a pipe gate, at least one first channel layer including a first pipe channel layer formed in the pipe gate and a pair of first source side channel layer and first drain side channel layer connected to the first pipe channel layer, and at least one second channel layer including a second pipe channel layer formed in the pipe gate and positioned over the first pipe channel layer and a pair of second source side channel layer and second drain side channel layer connected to the second pipe channel layer.
Public/Granted literature
- US20130153978A1 3D NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-06-20
Information query
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