Invention Grant
US08879046B2 Method for moving an optical element of a projection exposure apparatus for microlithography
有权
用于移动用于微光刻的投影曝光装置的光学元件的方法
- Patent Title: Method for moving an optical element of a projection exposure apparatus for microlithography
- Patent Title (中): 用于移动用于微光刻的投影曝光装置的光学元件的方法
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Application No.: US14085572Application Date: 2013-11-20
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Publication No.: US08879046B2Publication Date: 2014-11-04
- Inventor: Karl-Eugen Aubele , Sven Ulmer , Klaus Rief , Marco Jassmann
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102011076685 20110530
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G03F7/20 ; G02B7/00 ; H02N2/02 ; H02N2/06
Abstract:
A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.
Public/Granted literature
- US20140078487A1 METHOD FOR MOVING AN OPTICAL ELEMENT OF A PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY Public/Granted day:2014-03-20
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