Invention Grant
US08879047B2 Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine
有权
在浸没式光刻机中的晶片更换期间使用衬垫构件或第二阶段将浸没流体保持在投影透镜下方的间隙中的装置和方法
- Patent Title: Apparatus and method for maintaining immersion fluid in the gap under the projection lens using a pad member or second stage during wafer exchange in an immersion lithography machine
- Patent Title (中): 在浸没式光刻机中的晶片更换期间使用衬垫构件或第二阶段将浸没流体保持在投影透镜下方的间隙中的装置和方法
-
Application No.: US12923823Application Date: 2010-10-08
-
Publication No.: US08879047B2Publication Date: 2014-11-04
- Inventor: Michael Binnard
- Applicant: Michael Binnard
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20 ; G03B27/52
Abstract:
An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative to the substrate table. The substrate table and the pad member are moved together during a transition from a first state to a second state, the first state being a state in which an immersion liquid is maintained in a space between the optical member and the substrate table, the second state being a state in which the immersion liquid is maintained in a space between the optical member and the pad member. The optical member is kept in contact with the immersion liquid during the transition.
Public/Granted literature
Information query
