The technological fabrication of the integrated circuit includes a fabrication of the integrated circuit in a reduced technological version of a native technology including at least a first dimensional compensation applied to the reduced channel length and to the reduced channel width of each transistor originating from a transistor, referred to as a “minimum transistor”, designed in the native technology and having in this native technology an initial channel length equal to a minimum length for the native technology and an initial channel width equal to a minimum width for the native technology. The fabrication obtains a transistor having a channel length equal, to a given precision, to the initial channel length and a channel width equal, to a given precision, to the initial channel width.