Invention Grant
- Patent Title: Illumination system and lithographic apparatus
- Patent Title (中): 照明系统和光刻设备
-
Application No.: US13114652Application Date: 2011-05-24
-
Publication No.: US08885144B2Publication Date: 2014-11-11
- Inventor: Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
- Applicant: Bert Jan Claessens , Heine Melle Mulder , Paul Van Der Veen , Wilfred Edward Endendijk , Willem Jan Bouman , Bert Pieter Van Drieënhuizen , Jozef Ferdinand Dymphna Verbeeck , Marc Hendricus Margaretha Dassen , Thijs Johan Henry Hollink
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G02B5/08
- IPC: G02B5/08 ; G03B27/32 ; G03B27/54 ; G03F7/20
Abstract:
An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
Public/Granted literature
- US20110310372A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS Public/Granted day:2011-12-22
Information query
