Invention Grant
US08885973B2 Method for determining distortions in a particle-optical apparatus
有权
用于确定粒子光学装置中的失真的方法
- Patent Title: Method for determining distortions in a particle-optical apparatus
- Patent Title (中): 用于确定粒子光学装置中的失真的方法
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Application No.: US13799223Application Date: 2013-03-13
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Publication No.: US08885973B2Publication Date: 2014-11-11
- Inventor: Bernd Rieger , Michiel van der Stam
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent John B. Kelly; Michael O. Scheinberg
- Priority: EP08171413 20081212
- Main IPC: G06K9/40
- IPC: G06K9/40 ; G06K9/32 ; G06T5/50 ; H01J37/26 ; H01J37/22 ; G06T5/00

Abstract:
The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields (303, 304-i) showing identical parts of the sample are compared. These sub-fields (303, 304-i) will show small differences, corresponding to differential aberrations. In this way the differential aberrations in a large number of points can determined, after which the aberrations for each point can be determined by integration. By now correcting the position of each detected pixel in an image to be displayed, the displayed image has much reduced aberrations. An advantage of the method according to the invention is that no highly accurate steps of the sample are needed, nor is a sample with known geometry needed.
Public/Granted literature
- US20130266240A1 METHOD FOR DETERMINING DISTORTIONS IN A PARTICLE-OPTICAL APPARATUS Public/Granted day:2013-10-10
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