Invention Grant
- Patent Title: Method for producing silicon waveguides on non-SOI substrate
- Patent Title (中): 在非SOI衬底上制造硅波导的方法
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Application No.: US13458900Application Date: 2012-04-27
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Publication No.: US08889017B2Publication Date: 2014-11-18
- Inventor: Ching-Fuh Lin , Shih-Che Hung , Shu-Jia Syu
- Applicant: Ching-Fuh Lin , Shih-Che Hung , Shu-Jia Syu
- Applicant Address: TW Taipei
- Assignee: National Taiwan University
- Current Assignee: National Taiwan University
- Current Assignee Address: TW Taipei
- Agency: Stout, Uxa & Buyan, LLP
- Agent Donald E. Stout
- Priority: TW100137067A 20111012
- Main IPC: H01L21/02
- IPC: H01L21/02 ; G02B6/136 ; G02B6/12
Abstract:
The present invention relates to a method for producing silicon waveguides on non-SOI substrate (non-silicon-on-insulator substrate), and particularly relates to a method for producing silicon waveguides on silicon substrate with a laser. This method includes the following steps: (1) forming a ridge structure with high aspect ratio on a non-SOI substrate; (2) melting and reshaping the ridge structure by laser illumination for forming a structure having broad upper part and narrow lower part; and (3) oxidizing the structure having broad upper part and narrow lower part to form a silicon waveguide.
Public/Granted literature
- US20130095659A1 METHOD FOR PRODUCING SILICON WAVEGUIDES ON NON-SOI SUBSTRATE Public/Granted day:2013-04-18
Information query
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