Invention Grant
- Patent Title: High frequency amplifier
- Patent Title (中): 高频放大器
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Application No.: US13852159Application Date: 2013-03-28
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Publication No.: US08896380B2Publication Date: 2014-11-25
- Inventor: Tomihiko Shibuya , Atsushi Ajioka , Atsushi Tsumita
- Applicant: TDK Corporation
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2012-074198 20120328
- Main IPC: H03F3/04
- IPC: H03F3/04 ; H03F3/19 ; H01L23/66

Abstract:
A high frequency amplifier is characterized wherein a power amplification element and at least one of temperature compensation elements are adjacently provided on a first semiconductor layer, a first wiring pattern connected to the power amplification element, a second wiring pattern connected to the temperature compensation element, and a ground electrode are provided on at least one of second semiconductor layers existing in layers different from the first semiconductor layer, and the ground electrode is formed on the second semiconductor layer corresponding to a region that substantially projects a crevice part on which the temperature compensation element and the power amplification element are provided, on the same plane as the first semiconductor element.
Public/Granted literature
- US20130257540A1 HIGH FREQUENCY AMPLIFIER Public/Granted day:2013-10-03
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