Invention Grant
US08896817B2 Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method
有权
光刻投影装置，装置制造方法以及用于装置制造方法的传感器和扩散器的掩模
- Patent Title: Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing method
- Patent Title (中): 光刻投影装置，装置制造方法以及用于装置制造方法的传感器和扩散器的掩模
-
Application No.: US11545763Application Date: 2006-10-11
-
Publication No.: US08896817B2Publication Date: 2014-11-25
- Inventor: Marcus Adrianus Van De Kerkhof , Bearrach Moest
- Applicant: Marcus Adrianus Van De Kerkhof , Bearrach Moest
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03F7/20 ; G03F9/00
Abstract:
During an alignment calibration process in a lithographic apparatus using a sensor to detect a property of a projected image at substrate level, a diffuser is inserted into the illumination beam to increase the range of angles of radiation incident on the substrate. Thereby it can be ensured that sufficient radiation enters the sensor even when there is a mismatch between the illumination mode used and the acceptance NA of the sensor.
Public/Granted literature
Information query
