Invention Grant
- Patent Title: Annealing apparatus
- Patent Title (中): 退火设备
-
Application No.: US12864792Application Date: 2009-01-19
-
Publication No.: US08897631B2Publication Date: 2014-11-25
- Inventor: Shigeru Kasai , Hiroyuki Miyashita , Tomohiro Suzuki , Masatake Yoneda , Kazuhiro Ooya
- Applicant: Shigeru Kasai , Hiroyuki Miyashita , Tomohiro Suzuki , Masatake Yoneda , Kazuhiro Ooya
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-016475 20080128; JP2008-122117 20080508; JP2008-245176 20080925
- International Application: PCT/JP2009/050625 WO 20090119
- International Announcement: WO2009/096248 WO 20090806
- Main IPC: F27D11/12
- IPC: F27D11/12 ; H01L21/67 ; H01L21/324 ; H01L21/268

Abstract:
An annealing apparatus includes heating sources provided to face a wafer W, the heating sources having LEDs emitting lights to the wafer; light-transmitting members for transmitting the lights emitted from the LEDs; and cooling members made of aluminum and provided to directly contact with the heating sources, respectively. The heating sources include a plurality of LED arrays having supporters made of AlN, each having one surface on which the LEDs are adhered by using a silver paste; and other surface on which thermal diffusion members made of copper are adhered by using a solder. The LED arrays are fixed to the cooling member by using screws via a silicone grease.
Public/Granted literature
- US20110033175A1 ANNEALING APPARATUS Public/Granted day:2011-02-10
Information query