Invention Grant
- Patent Title: Test device for testing depth of chamfer
- Patent Title (中): 用于测试倒角深度的测试装置
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Application No.: US13593538Application Date: 2012-08-24
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Publication No.: US08898924B2Publication Date: 2014-12-02
- Inventor: Bing-Jun Zhang
- Applicant: Bing-Jun Zhang
- Applicant Address: CN Shenzhen TW New Taipei
- Assignee: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd.,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hong Fu Jin Precision Industry (ShenZhen) Co., Ltd.,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Shenzhen TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN201210283899 20120810
- Main IPC: G01B5/18
- IPC: G01B5/18 ; G01B3/22

Abstract:
A test device includes a base rested on an object, an inserting member slidably mounted to the base and contacts a slanted surface of a chamfer of the object, and a test member slidably rested on the base. The base includes a positioning bar abutting a bottom end of the chamfer. A first cutout and a second cutout communicating with the first cutout and positioned in front of the first cutout are defined in a bottom surface of the testing member. A depth of the second cutout equals the tolerance of a standard depth of the chamfer. If a top surface of the inserting member can be received in the second cutout, the depth of the chamfer is qualified. If the top surface of the inserting member cannot be received in the second cutout, the depth of the chamfer is unqualified.
Public/Granted literature
- US20140041246A1 TEST DEVICE FOR TESTING DEPTH OF CHAMFER Public/Granted day:2014-02-13
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