Invention Grant
- Patent Title: Method for treating a transport support for the conveyance and atmospheric storage of semiconductor substrates, and treatment station for the implementation of such a method
- Patent Title (中): 用于处理半导体衬底的输送和大气存储的运输支撑件的方法以及用于实施这种方法的处理站
-
Application No.: US12733081Application Date: 2008-08-11
-
Publication No.: US08898930B2Publication Date: 2014-12-02
- Inventor: Erwan Godot , Remi Thollot , Amaud Favre
- Applicant: Erwan Godot , Remi Thollot , Amaud Favre
- Applicant Address: FR Paris
- Assignee: Alcatel Lucent
- Current Assignee: Alcatel Lucent
- Current Assignee Address: FR Paris
- Agency: Carmen Patti Law Group, LLC
- Priority: FR0757049 20070813
- International Application: PCT/EP2008/060548 WO 20080811
- International Announcement: WO2009/021941 WO 20090219
- Main IPC: B08B7/00
- IPC: B08B7/00 ; F26B5/04 ; F26B25/22 ; H01L21/67 ; H01L21/673 ; H01L21/677 ; F26B5/00
Abstract:
The aim of the invention is to provide a method for the treatment of a transport support (1) for the conveyance and storage of semiconductor substrates, with said support (1) possibly having first undergone a cleaning operation using a liquid. The method includes a treatment stage in which the transport support (1) is placed in a sealed chamber (4) connected to a vacuum pump (5) and said transport support (1) is subjected to the combined action of a subatmospheric pressure and infrared radiation to favor the removal of foreign bodies on the walls of the transport support (1).The invention also concerns a treatment station for a transport support (1) for implementation of the method.
Public/Granted literature
Information query
