Invention Grant
- Patent Title: Sputtering device with gas injection assembly
- Patent Title (中): 带气体注入组件的溅射装置
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Application No.: US12797422Application Date: 2010-06-09
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Publication No.: US08899565B2Publication Date: 2014-12-02
- Inventor: Sung Eun Kim
- Applicant: Sung Eun Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2004-0068696 20040830
- Main IPC: C23C14/50
- IPC: C23C14/50
Abstract:
A sputtering device includes a chamber; and a substrate transferring unit for loading a substrate into, or unloading the substrate from the chamber, the substrate transferring unit including a gas injection assembly forming a gas cushion between the substrate and an upper surface of the substrate transferring unit.
Public/Granted literature
- US20100243436A1 SPUTTERING DEVICE WITH GAS INJECTION ASSEMBLY Public/Granted day:2010-09-30
Information query
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