Invention Grant
- Patent Title: Device and method for continuous chemical vapour deposition under atmospheric pressure and use thereof
- Patent Title (中): 在大气压下连续化学气相沉积的装置和方法及其用途
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Application No.: US12067233Application Date: 2006-09-22
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Publication No.: US08900368B2Publication Date: 2014-12-02
- Inventor: Stefan Reber , Albert Hurrle , Norbert Schillinger
- Applicant: Stefan Reber , Albert Hurrle , Norbert Schillinger
- Applicant Address: DE München
- Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V.
- Current Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V.
- Current Assignee Address: DE München
- Agency: Gibson & Dernier LLP
- Agent Matthew B. Dernier, Esq.
- Priority: DE102005045582 20050923
- International Application: PCT/EP2006/009228 WO 20060922
- International Announcement: WO2007/033832 WO 20070329
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/458 ; C23C16/54 ; C23C16/44
Abstract:
The invention relates to a device and a method for continuous chemical vapor deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.
Public/Granted literature
- US20080317956A1 Device and Method for Continuous Chemical Vapour Deposition Under Atmospheric Pressure and Use Thereof Public/Granted day:2008-12-25
Information query
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