Invention Grant
- Patent Title: Oxidation treatment method and oxidation treatment apparatus
- Patent Title (中): 氧化处理方法和氧化处理装置
-
Application No.: US13176154Application Date: 2011-07-05
-
Publication No.: US08900540B2Publication Date: 2014-12-02
- Inventor: Yoshiki Nishiwaki , Hidetoshi Oota
- Applicant: Yoshiki Nishiwaki , Hidetoshi Oota
- Applicant Address: JP Tokyo
- Assignee: Taiyo Nippon Sanso Corporation
- Current Assignee: Taiyo Nippon Sanso Corporation
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye P.C.
- Priority: JPP2010-153416 20100705
- Main IPC: C01B13/11
- IPC: C01B13/11 ; D06M23/10 ; D06M11/34 ; B22F1/00 ; D06M101/40

Abstract:
An oxidation treatment method of the present invention includes the step of bringing a solution having an ozone concentration of 120 to 500 mg/L into contact with a substance to be treated made of a combustible substance, thereby subjecting the substance to be treated and the surface thereof to an oxidation treatment. An oxidation treatment apparatus of the present invention includes: a dissolving means that dissolves an oxygen-ozone mixed gas in a fluorine-based solvent to form mixed fluid; an undissolved gas removal means that removes an undissolved gas from the mixed fluid to form a solution; and an oxidation treatment means that brings the solution into contact with a substance to be treated made of a combustible substance, thereby subjecting the substance to be treated and the surface thereof to an oxidation treatment.
Public/Granted literature
- US20120003143A1 OXIDATION TREATMENT METHOD AND OXIDATION TREATMENT APPARATUS Public/Granted day:2012-01-05
Information query