Invention Grant
- Patent Title: Nitride semiconductor laser element
- Patent Title (中): 氮化物半导体激光元件
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Application No.: US12814132Application Date: 2010-06-11
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Publication No.: US08900901B2Publication Date: 2014-12-02
- Inventor: Shingo Masui , Tomonori Morizumi
- Applicant: Shingo Masui , Tomonori Morizumi
- Applicant Address: JP Anan-shi
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Anan-shi
- Agency: Global IP Counselors, LLP
- Priority: JP2006-354634 20061228; JP2007-319099 20071211
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01S5/22 ; B82Y20/00 ; H01L21/02 ; H01S5/028 ; H01S5/20 ; H01S5/30 ; H01S5/343

Abstract:
A method is for manufacturing a nitride semiconductor laser element including a substrate, a nitride semiconductor layer that is laminated on the substrate and that has a ridge on its surface, an insulating protective film, and an electrode that is electrically connected with the nitride semiconductor layer. The method includes forming the ridge; forming a monocrystalline first film from the side faces of the ridge to the nitride semiconductor layer on both sides of the ridge; and forming a second film containing polycrystalline or an amorphous substance over the first film thereby forming the insulating protective film.
Public/Granted literature
- US20100248406A1 NITRIDE SEMICONDUCTOR LASER ELEMENT Public/Granted day:2010-09-30
Information query
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