- Patent Title: Charged particle beam lens and exposure apparatus using the same
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Application No.: US14004845Application Date: 2012-03-14
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Publication No.: US08901511B2Publication Date: 2014-12-02
- Inventor: Takahisa Kato , Yutaka Setomoto
- Applicant: Takahisa Kato , Yutaka Setomoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2011-056813 20110315
- International Application: PCT/JP2012/001773 WO 20120314
- International Announcement: WO2012/124319 WO 20120920
- Main IPC: H01J37/12
- IPC: H01J37/12 ; H01J37/18

Abstract:
An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are smaller than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.
Public/Granted literature
- US20140151570A1 CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME Public/Granted day:2014-06-05
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