Invention Grant
- Patent Title: Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
- Patent Title (中): 平版印刷设备，清洁系统和用于原位去除光刻设备中部件污染的清洁方法
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Application No.: US12153245Application Date: 2008-05-15
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Publication No.: US08902399B2Publication Date: 2014-12-02
- Inventor: Rene Theodorus Petrus Compen , Joost Jeroen Ottens
- Applicant: Rene Theodorus Petrus Compen , Joost Jeroen Ottens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.
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