Invention Grant
- Patent Title: Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus
- Patent Title (中): 平版印刷设备和使用光刻设备制造设备的方法
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Application No.: US13039072Application Date: 2011-03-02
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Publication No.: US08902400B2Publication Date: 2014-12-02
- Inventor: Raymond Wilhelmus Louis Lafarre , Michel Riepen , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
- Applicant: Raymond Wilhelmus Louis Lafarre , Michel Riepen , Rogier Hendrikus Magdalena Cortie , Ralph Joseph Meijers , Fabrizio Evangelista
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.
Public/Granted literature
- US20110216292A1 LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS Public/Granted day:2011-09-08
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