Invention Grant
- Patent Title: Stage apparatus, exposure apparatus and device fabrication method
- Patent Title (中): 舞台装置,曝光装置和装置制造方法
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Application No.: US13311767Application Date: 2011-12-06
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Publication No.: US08902405B2Publication Date: 2014-12-02
- Inventor: Atsushi Ito
- Applicant: Atsushi Ito
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2010-278394 20101214
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G01B9/02

Abstract:
The present invention provides a stage apparatus including a first Y-axis interferometer which is supported by a base portion, and configured to detect a position of a first end surface of a table in a Y-axis direction, a second Y-axis interferometer which is supported by the base portion, and configured to detect a position of a second end surface of the table in the Y-axis direction, and a third Y-axis interferometer which is supported by the base portion so as to be spaced apart from the first Y-axis interferometer and the second Y-axis interferometer in an X-axis direction, and configured to detect a distance according to which a distance between the first Y-axis interferometer and the second Y-axis interferometer in the Y-axis direction can be obtained.
Public/Granted literature
- US20120147352A1 STAGE APPARATUS, EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD Public/Granted day:2012-06-14
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