Invention Grant
- Patent Title: Defect inspection apparatus and defect inspection method using the same
- Patent Title (中): 缺陷检查装置和缺陷检查方法使用
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Application No.: US13472145Application Date: 2012-05-15
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Publication No.: US08902412B2Publication Date: 2014-12-02
- Inventor: Young-Hoon Sohn , Yu-Sin Yang , Sang-Kil Lee
- Applicant: Young-Hoon Sohn , Yu-Sin Yang , Sang-Kil Lee
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2011-0055210 20110608
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/55 ; G01N21/95

Abstract:
A defect inspection apparatus comprises a table on which a substrate is placed, a first detection unit which is disposed above the table to detect an optical signal from the substrate, a second detection unit which is disposed above the table to detect an electrical signal from the substrate, and a signal processing unit which is connected to the first detection unit and the second detection unit to detect a chemical defect using the optical signal and the electrical signal.
Public/Granted literature
- US20120314205A1 DEFECT INSPECTION APPARATUS AND DEFECT INSPECTION METHOD USING THE SAME Public/Granted day:2012-12-13
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