Invention Grant
US08902522B2 Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
有权
使用300nm以下的超短波曝光装置的固体摄像装置的滤色片的制备用彩色感光性树脂组合物，使用该曝光设备的滤色器以及包含该彩色滤光片的固体摄像装置
- Patent Title: Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
- Patent Title (中): 使用300nm以下的超短波曝光装置的固体摄像装置的滤色片的制备用彩色感光性树脂组合物，使用该曝光设备的滤色器以及包含该彩色滤光片的固体摄像装置
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Application No.: US13381289Application Date: 2010-07-01
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Publication No.: US08902522B2Publication Date: 2014-12-02
- Inventor: Sang Haeng Lee , Seung No Lee , Jeung Hoon On , Ji Min Chun
- Applicant: Sang Haeng Lee , Seung No Lee , Jeung Hoon On , Ji Min Chun
- Applicant Address: KR
- Assignee: Dongwoo Fine-Chem Co., Ltd.
- Current Assignee: Dongwoo Fine-Chem Co., Ltd.
- Current Assignee Address: KR
- Agency: Workman Nydegger
- Priority: KR10-2009-0060147 20090702; KR10-2009-0060148 20090702; KR10-2009-0060149 20090702
- International Application: PCT/KR2010/004288 WO 20100701
- International Announcement: WO2011/002247 WO 20110106
- Main IPC: G02B5/22
- IPC: G02B5/22 ; G02B5/20 ; G03F7/031 ; G03F7/00
Abstract:
Disclosed is a colored photosensitive resin composition for a color filter of a solid state imaging device using an ultra-short wavelength exposing device of 300 nm or less, a color filter and a solid state imaging device including the same. The colored photosensitive resin composition can fabricate a color filter having a micro-patterned colored pattern. The color filter can be advantageously applied to a solid state imaging device.
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