Invention Grant
- Patent Title: Semiconductor storage device and its manufacturing method
- Patent Title (中): 半导体存储装置及其制造方法
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Application No.: US13824888Application Date: 2011-12-06
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Publication No.: US08902644B2Publication Date: 2014-12-02
- Inventor: Noboru Sakimura , Ryusuke Nebashi , Tadahiko Sugibayashi
- Applicant: Noboru Sakimura , Ryusuke Nebashi , Tadahiko Sugibayashi
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2010-277866 20101214
- International Application: PCT/JP2011/078215 WO 20111206
- International Announcement: WO2012/081453 WO 20120621
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C11/14 ; H01L29/82 ; H01L27/22 ; H01L43/12 ; G11C11/16

Abstract:
A magnetoresistive element 10 having a memory cell 100 according to the present invention contains a first lower terminal n1 and a second lower terminal n2 respectively connected to both ends of a conductive layer 3 whose longitudinal direction is different from the column direction (X direction). Further, the gates of the first transistors M1 respectively included in two memory cells among the plurality of memory cells 100 and adjacent to each other in a row direction (Y direction) are commonly connected to a first word line 14. As a result, without increase of the cell area, it becomes possible to reserve a margin in the dimension of the cell structure or in the process for MRMA.
Public/Granted literature
- US20130182501A1 SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING METHOD Public/Granted day:2013-07-18
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