Invention Grant
- Patent Title: X-ray diffraction apparatus
- Patent Title (中): X射线衍射装置
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Application No.: US13361505Application Date: 2012-01-30
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Publication No.: US08903044B2Publication Date: 2014-12-02
- Inventor: Sigematsu Asano , Ichiro Tobita , Atsushi Ohbuchi , Takayuki Konya
- Applicant: Sigematsu Asano , Ichiro Tobita , Atsushi Ohbuchi , Takayuki Konya
- Applicant Address: JP Tokyo
- Assignee: Rigaku Corporation
- Current Assignee: Rigaku Corporation
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2011-017511 20110131
- Main IPC: G01N23/20
- IPC: G01N23/20 ; G01N23/207

Abstract:
An X-ray shielding member is provided so as to confront an X-ray incident face of a sample, and a gap through which an X-ray emitted from an X-ray source is passed and irradiated to an X-ray incident face of the sample is formed between the X-ray shielding member and the X-ray incident face of the sample. A gap adjusting mechanism for moving the X-ray shielding member is further provided to move the X-ray shielding member in accordance with change of an X-ray incident angle to the sample by a goniometer, whereby the breadth of the gap formed between the X-ray shielding member and the X-ray incident face of the sample can be adjusted.
Public/Granted literature
- US20120195406A1 X-RAY DIFFRACTION APPARATUS Public/Granted day:2012-08-02
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