Invention Grant
- Patent Title: Apparatus and process for passivating an SRF cavity
- Patent Title (中): 用于钝化SRF腔的装置和方法
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Application No.: US12925503Application Date: 2010-10-23
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Publication No.: US08903464B1Publication Date: 2014-12-02
- Inventor: Ganapati Rao Myneni , John P. Wallace
- Applicant: Ganapati Rao Myneni , John P. Wallace
- Applicant Address: US VA Newport News
- Assignee: Jefferson Science Associates, LLC
- Current Assignee: Jefferson Science Associates, LLC
- Current Assignee Address: US VA Newport News
- Main IPC: H01L39/24
- IPC: H01L39/24 ; H01J23/20 ; H05H7/20

Abstract:
An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field.Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided.
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