Invention Grant
- Patent Title: Vibration isolation module and substrate processing system
- Patent Title (中): 振动隔离模块和基板处理系统
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Application No.: US14241109Application Date: 2012-09-10
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Publication No.: US08905369B2Publication Date: 2014-12-09
- Inventor: Jerry Johannes Martinus Peijster , Rogier Martin Lambert Ellenbroek , Guido De Boer
- Applicant: Jerry Johannes Martinus Peijster , Rogier Martin Lambert Ellenbroek , Guido De Boer
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen
- International Application: PCT/EP2012/067608 WO 20120910
- International Announcement: WO2013/034753 WO 20130314
- Main IPC: H01J37/20
- IPC: H01J37/20 ; F16F15/04 ; F16F15/10 ; H01J37/317 ; H01J37/02 ; G03F7/20 ; F16F15/08
Abstract:
The invention relates to a vibration isolation module (101) for a lithographic apparatus or an inspection apparatus. The module comprises a support frame (102), an intermediate body (103) and a support body (104) for accommodating the lithographic apparatus. The intermediate body is connected to the support frame by means of at least one spring element such that the intermediate body is a hanging body. The support body is connected to the intermediate body by means of at least one pendulum rod (108) such that the support body is a hanging body. The invention further relates to a substrate processing system comprising such vibration isolation module.
Public/Granted literature
- US20140197330A1 VIBRATION ISOLATION MODULE AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2014-07-17
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