The present disclosure describes a mask. The mask includes a low thermal expansion material (LTEM) substrate, at least two absorber layers, and a spacer layer separating the two absorber layers. The first absorber layer is deposited over the LTEM substrate. The mask further includes a topcoat layer over the absorber layer. A thickness of the spacer layer is approximately equal to a height of a topography feature on a wafer substrate multiplied by the square of a demagnification of an objective lens. The absorber layers include staged patterns.