Invention Grant
- Patent Title: Negative-working thick film photoresist
- Patent Title (中): 负性厚膜光致抗蚀剂
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Application No.: US13524811Application Date: 2012-06-15
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Publication No.: US08906594B2Publication Date: 2014-12-09
- Inventor: Chunwei Chen , PingHung Lu , Weihong Liu , Medhat Toukhy , SangChul Kim , SookMee Lai
- Applicant: Chunwei Chen , PingHung Lu , Weihong Liu , Medhat Toukhy , SangChul Kim , SookMee Lai
- Applicant Address: LU Luxembourg
- Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
- Current Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
- Current Assignee Address: LU Luxembourg
- Agent Sangya Jain
- Main IPC: G03F7/028
- IPC: G03F7/028 ; G03F7/075 ; G03F7/40 ; G03F7/30
Abstract:
Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
Public/Granted literature
- US20130337381A1 NEGATIVE-WORKING THICK FILM PHOTORESIST Public/Granted day:2013-12-19
Information query
IPC分类:
