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US08906706B2 Method of fabricating a mask structure for patterning a workpiece by ions 有权
通过离子制造用于图案化工件的掩模结构的方法

Method of fabricating a mask structure for patterning a workpiece by ions
Abstract:
A method of fabricating workpieces includes one or more layers on a substrate that are masked with an ion implantation mask comprising two or more layers. The mask layers include a first mask layer closer to the substrate, and a second mask layer on the first mask layer. The method also comprises ion implanting one or more of the layers on the substrate. Ion implantation may form portions with altered physical properties from the layers under the mask. The portions may form a plurality of non-magnetic regions corresponding to apertures in the mask.
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