Invention Grant
- Patent Title: Method for making light emitting diode
- Patent Title (中): 制造发光二极管的方法
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Application No.: US13902958Application Date: 2013-05-27
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Publication No.: US08906726B2Publication Date: 2014-12-09
- Inventor: Yang Wei , Shou-Shan Fan
- Applicant: Tsinghua University , Hon Hai Precision Industry Co., Ltd.
- Applicant Address: CN Beijing TW New Taipei
- Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Tsinghua University,Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: CN Beijing TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN2011101107286 20110429
- Main IPC: H01L33/62
- IPC: H01L33/62

Abstract:
A method for making light emitting diode, the method includes the following steps. First, a substrate having an epitaxial growth surface is provided. Second, a carbon nanotube layer is suspended above the epitaxial growth surface. Third, a first semiconductor layer, an active layer and a second semiconductor layer are grown on the epitaxial growth surface in that order, wherein the first semiconductor layer includes a buffer layer, an intrinsic semiconductor layer, and a doped semiconductor layer stacked in that order. Fourth, the doped semiconductor layer is exposed by removing the substrate, the buffer layer, and the intrinsic semiconductor layer. Fifth, a first electrode is prepared on the first semiconductor layer and a second electrode is prepared on the second semiconductor layer.
Public/Granted literature
- US20130260487A1 METHOD FOR MAKING LIGHT EMITTING DIODE Public/Granted day:2013-10-03
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