Invention Grant
- Patent Title: Delay line structure
- Patent Title (中): 延迟线结构
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Application No.: US13181599Application Date: 2011-07-13
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Publication No.: US08907743B2Publication Date: 2014-12-09
- Inventor: Guang-Hwa Shiue , Po-Wei Chiu
- Applicant: Guang-Hwa Shiue , Po-Wei Chiu
- Applicant Address: TW Chung Li
- Assignee: Chung Yuan Christian University
- Current Assignee: Chung Yuan Christian University
- Current Assignee Address: TW Chung Li
- Agency: Rosenberg, Klein & Lee
- Priority: TW99125913A 20100804
- Main IPC: H01P9/02
- IPC: H01P9/02

Abstract:
A delay line structure includes a flat spiral delay line and two grounding guard traces. The flat spiral delay line is disposed in the layout layer in a manner of extending from an input end, bending clockwise inward until reaching a U-turn part, continuously extending and bending counterclockwise outward to an out put end so as to form two coupling areas, which are spiral and have an opening respectively. The two grounding guard traces are disposed in the layout layer in a manner of extending from the openings respectively toward the coupling areas, having an interval between the grounding guard traces and the flat spiral delay line, wherein the grounding guard traces close to the openings of the coupling areas are electrically connected to the grounding circuit through a via respectively.
Public/Granted literature
- US20120032754A1 DELAY LINE STRUCTURE Public/Granted day:2012-02-09
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