Invention Grant
US08910090B2 Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications
有权
涉及模式匹配的方法来识别和解决双重图案化应用中潜在的非双重图案化兼容图案
- Patent Title: Methods involving pattern matching to identify and resolve potential non-double-patterning-compliant patterns in double patterning applications
- Patent Title (中): 涉及模式匹配的方法来识别和解决双重图案化应用中潜在的非双重图案化兼容图案
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Application No.: US13778322Application Date: 2013-02-27
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Publication No.: US08910090B2Publication Date: 2014-12-09
- Inventor: Lynn T. Wang , Vito Dai , Luigi Capodieci
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
One illustrative method disclosed herein involves producing an initial circuit layout, prior to decomposing the initial circuit layout, identifying at least one potential non-double-patterning-compliant (NDPC) pattern in the initial circuit layout, fixing the at least one potential non-double-patterning-compliant (NDPC) pattern so as to produce a double-patterning-compliant (DPT) pattern, producing a modified circuit layout by removing the potential non-double-patterning-compliant (NDPC) pattern and adding the double-patterning-compliant (DPT) pattern to the initial circuit layout, and performing design rule checking and double patterning compliance checking on the modified circuit layout.
Public/Granted literature
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