Invention Grant
US08912513B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
带电粒子束写入装置和带电粒子束写入方法

Charged particle beam writing apparatus and charged particle beam writing method
Abstract:
A charged particle beam writing apparatus according to an embodiment, includes a laser displacement meter configured to measure a position of a substrate to be written; a correction unit configured to correct a misregistration amount of the position of the substrate measured by the laser displacement meter from a reference position of the substrate; and a writing unit configured to write a pattern onto the substrate corrected for the misregistration amount by using a charged particle beam.
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