Invention Grant
- Patent Title: Charged particle beam writing apparatus and charged particle beam writing method
- Patent Title (中): 带电粒子束写入装置和带电粒子束写入方法
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Application No.: US13799035Application Date: 2013-03-13
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Publication No.: US08912513B2Publication Date: 2014-12-16
- Inventor: Kentaro Omi , Michihiro Kawaguchi , Keisuke Yamaguchi
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Patterson & Sheridan, LLP
- Priority: JP2012-065385 20120322
- Main IPC: G21K5/04
- IPC: G21K5/04 ; H01J37/22 ; H01J37/317 ; H01J37/304

Abstract:
A charged particle beam writing apparatus according to an embodiment, includes a laser displacement meter configured to measure a position of a substrate to be written; a correction unit configured to correct a misregistration amount of the position of the substrate measured by the laser displacement meter from a reference position of the substrate; and a writing unit configured to write a pattern onto the substrate corrected for the misregistration amount by using a charged particle beam.
Public/Granted literature
- US20130250282A1 Charged Particle Beam Writing Apparatus and Charged Particle Beam Writing Method Public/Granted day:2013-09-26
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