Invention Grant
- Patent Title: Gate amplification triac
- Patent Title (中): 门放大三端双向可控硅
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Application No.: US13658670Application Date: 2012-10-23
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Publication No.: US08912566B2Publication Date: 2014-12-16
- Inventor: Yannick Hague
- Applicant: Yannick Hague
- Applicant Address: FR Tours
- Assignee: STMicroelectronics (Tours) SAS
- Current Assignee: STMicroelectronics (Tours) SAS
- Current Assignee Address: FR Tours
- Agency: Allen, Dyer, Doppelt, Milbrath & Gilchrist, P.A.
- Priority: FR1159707 20111026
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/747 ; H01L29/74 ; H01L29/06

Abstract:
A gate amplification triac including in a semiconductor substrate of a first conductivity type a vertical triac and a lateral bipolar transistor having its emitter connected to the triac gate, its base connected to a control terminal, and its collector connected to a terminal intended to be connected to a first reference voltage, the main terminal of the triac on the side of the transistor being intended to be connected to a second reference voltage, the transistor being formed in a first well of the second conductivity type and the triac comprising on the transistor side a second well of the second conductivity type, the first and second wells being formed so that the substrate-well breakdown voltage of the transistor is greater than the substrate-well breakdown voltage of the triac by at least the difference between the first and second reference voltages.
Public/Granted literature
- US20130105855A1 GATE AMPLIFICATION TRIAC Public/Granted day:2013-05-02
Information query
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