Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
-
Application No.: US13543069Application Date: 2012-07-06
-
Publication No.: US08912596B2Publication Date: 2014-12-16
- Inventor: Shunpei Yamazaki
- Applicant: Shunpei Yamazaki
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2011-156225 20110715
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/423 ; H01L29/45 ; H01L29/786

Abstract:
A transistor used for a semiconductor device for high power application needs to have a channel region for obtaining higher drain current. As an example of such a transistor, a vertical (trench type) transistor has been considered; however, the vertical transistor cannot have a high on/off ratio of drain current and thus cannot have favorable transistor characteristics. Over a substrate having conductivity, an oxide semiconductor layer having a surface having a dotted pattern of a plurality of island-shaped regions with a tapered shape in a cross section is sandwiched between a first electrode formed between the substrate and the oxide semiconductor layer and a second electrode formed over the oxide semiconductor layer, and a conductive layer functioning as a gate electrode is formed on the side surface of the island-shaped region in the oxide semiconductor layer with an insulating layer provided therebetween.
Public/Granted literature
- US20130015436A1 SEMICONDUCTOR DEVICE Public/Granted day:2013-01-17
Information query
IPC分类: