Invention Grant
- Patent Title: Semiconductor device including an oxide semiconductor layer
- Patent Title (中): 包括氧化物半导体层的半导体器件
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Application No.: US13733518Application Date: 2013-01-03
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Publication No.: US08916869B2Publication Date: 2014-12-23
- Inventor: Jun Koyama , Shunpei Yamazaki
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2009-255271 20091106
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12 ; H01L31/09 ; H01L27/146

Abstract:
A solid-state image sensor which holds a potential for a long time and includes a thin film transistor with stable electrical characteristics is provided. When the off-state current of a thin film transistor including an oxide semiconductor layer is set to 1×10−13 A or less and the thin film transistor is used as a reset transistor and a transfer transistor of the solid-state image sensor, the potential of the signal charge storage portion is kept constant, so that a dynamic range can be improved. When a silicon semiconductor which can be used for a complementary metal oxide semiconductor is used for a peripheral circuit, a high-speed semiconductor device with low power consumption can be manufactured.
Public/Granted literature
- US20130119380A1 SEMICONDUCTOR DEVICE Public/Granted day:2013-05-16
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