Invention Grant
- Patent Title: Multiplexing EUV sources in reticle inspection
- Patent Title (中): 在掩模版检查中复用EUV源
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Application No.: US13563850Application Date: 2012-08-01
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Publication No.: US08917432B2Publication Date: 2014-12-23
- Inventor: Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
- Applicant: Daniel Wack , Daimian Wang , Karl R. Umstadter , Ed Ma , Frank Chilese
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G02B26/08
- IPC: G02B26/08 ; G03F7/20 ; G02B26/12

Abstract:
The present disclosure is directed to an illumination system. The illumination system may include a base member rotatable about a rotation axis and a plurality of mirrors disposed on an outer surface of the base member along a perimeter of the base member. The mirrors may be oriented at a predetermined angle. The illumination system also includes at least two illumination sources. Each of the mirrors of the first plurality of mirrors is configured to receive radiation from the first illumination source at a first portion of each mirror at a first time. The mirror is configured to reflect the radiation to an optical path. Each of the mirrors is further configured to receive radiation from the second illumination source at a second portion of the mirror at a second time. The mirrors reflect the radiation from the second illumination source to the common optical path.
Public/Granted literature
- US20140036333A1 MULTIPLEXING EUV SOURCES IN RETICLE INSPECTION Public/Granted day:2014-02-06
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